Micron is a global leader in memory and storage, powering AI and compute-intensive applications from cloud to edge with innovative semiconductor solutions.
About the role
Micron in Boise, Idaho has a current need for a Senior or Staff R&D Photolithography Materials Engineer . Found on 1752vc Careers, the job board for startup and VC roles.
What they're looking for
- Must have knowledge and an understanding of chemical process specific to lithography, including materials for 365 nm, 248 nm, 193 nm, and EUV lithography
- Knowledge of optics for photolithography or other diffraction-limited imaging is preferred
- Coursework or industry experience showing strong statistical analysis skills, including DOEs and data analysis. Experience with JMP or other statistical analysis software is preferred
- Strong written and verbal communication skills. Ability to write and present clear and concise executive summaries for Micron and supplier management teams
More about this role
Our vision is to transform how the world uses information to enrich life for all .
Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever.
Micron in Boise, Idaho has a current need for a Senior or Staff R&D Photolithography Materials Engineer .
Our vision is to transform how the world uses information to enrich life for all.
Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever.
As an R&D Photolithography Materials Engineer at Micron Technology Inc., we are responsible for photolithography material selection and optimization for advanced memory devices. In this position, you will develop new technology and photo materials that meet device requirements and integrate new technology into manufacturing processes. This work could include photo materials for any photo processes including hardmasks and resists for I-line (365nm) through EUV (13.5nm). Additionally,...
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